Surface Chemistry Tutorial

Model ID: 9663


Surface chemistry is often the most important and most overlooked aspect of reacting flow modeling. Surface rate expressions can be hard to find or not even exist at all. Often it is preferable to use sticking coefficients to describe surface reactions because they can be estimated intuitively.
The tutorial model simulates outgassing from a wafer during a chemical vapor deposition (CVD) process. Careful attention is paid to the overall mass balance in the system and the difference between the mass averaged velocity and diffusion velocity is explored.

Ce modèle a été construit avec les éléments suivants:

Plasma Module Plasma Module