Surface Chemistry Tutorial
Application ID: 9663
Surface chemistry is often the most important and most overlooked aspect of reacting flow modeling. Surface rate expressions can be hard to find or not even exist at all. Often it is preferable to use sticking coefficients to describe surface reactions because they can be estimated intuitively.
The tutorial model simulates outgassing from a wafer during a chemical vapor deposition (CVD) process. Careful attention is paid to the overall mass balance in the system and the difference between the mass averaged velocity and diffusion velocity is explored.
This model is included as an example in the following products:Plasma Module
however additional products may be needed to reproduce it. This example may be created and run using components from the following product combinations:
The combination of COMSOL® products required to model your application depends on several factors and may include boundary conditions, material properties, physics interfaces, and part libraries. Particular functionality may be common to several products. To determine the right combination of products for your modeling needs, review the Grille de spécifications and make use of a free evaluation license. The COMSOL Sales and Support teams are available for answering any questions you may have regarding this.