La Bibliothèque d'Applications présente des modèles construits avec COMSOL Multiphysics pour la simulation d'une grande variété d'applications, dans les domaines de l'électromagnétisme, de la mécanique des solides, de la mécanique des fluides et de la chimie. Vous pouvez télécharger ces modèles résolus avec leur documentation détaillée, comprenant les instructions de construction pas-à-pas, et vous en servir comme point de départ de votre travail de simulation. Utilisez l'outil de recherche rapide pour trouver les modèles et applications correspondant à votre domaine d'intérêt. Notez que de nombreux exemples présentés ici sont également accessibles via la Bibliothèques d'Applications intégrée au logiciel COMSOL Multiphysics® et disponible à partir du menu Fichier.
This model uses the Reacting Flow multiphysics interface to simulate a methane steam reformer. The model accounts for the interactions between the chemical reactions, the transport of species, the fluid flow, and the heat transfer in a porous medium. En savoir plus
Electroless deposition or plating is a non-galvanic plating method that does not require any external electrical power. This technique is typically used for electroless plating of nickel, silver, gold and copper. In electroless deposition, partial oxidation and reduction reactions ... En savoir plus
The present model example is based on Copper Deposition in a Trench model available in Electrodeposition Application Library. The nonuniform deposition along the trench surface leads to formation of a cavity/void. Since the Deformed Geometry interface cannot handle topological changes, ... En savoir plus
Lead-acid batteries are widely used as starting batteries for various traction applications such as cars and trucks and so forth. The reason for this is the fairly low cost in combination with the performance robustness for a broad range of operating conditions. However, one drawback of ... En savoir plus
When anodizing aluminum, the surface is electrochemically altered to form an abrasive and corrosion-resistive Al2O3 film. The electrode kinetics during the process are only marginally affected as the oxide layer grows, so a stationary analysis of the current distribution is sufficient to ... En savoir plus
Chemical vapor deposition (CVD) is an important step in the process of manufacturing microchips. One common application is the deposition of silicon on wafers in low pressure reactors to obtain uniform deposition thicknesses. This example models the coupled reaction kinetics, fluid ... En savoir plus
This example models time-dependent copper deposition on a resistive wafer in a cupplater reactor. As the deposited layer builds up, the resistive losses of the deposited layer decreases. The benefit of using a current thief for a more uniform deposit is demonstrated. En savoir plus
This application demonstrates how you can access and include external thermodynamic and physical property calculations in your simulation, using the Thermodynamics feature. The example shows how you can easily modify the predefined Plug-flow reactor type in the Reaction Engineering ... En savoir plus
This example models cathodic protection of a steel reinforcing bar in concrete. Three different electrochemical reactions are considered on the steel surface. Charge and oxygen transport are modeled in the concrete domain, where the electrolyte conductivity and oxygen diffusivity depend ... En savoir plus
This model illustrates the effect of oxygen and hydrogen formation and recombination on the performance and self-discharge of an electrochemical capacitor with a water-based electrolyte. A load cycle consisting of mixed constant current pulses and rest periods at an open circuit is ... En savoir plus
