La Bibliothèque d'Applications présente des modèles construits avec COMSOL Multiphysics pour la simulation d'une grande variété d'applications, dans les domaines de l'électromagnétisme, de la mécanique des solides, de la mécanique des fluides et de la chimie. Vous pouvez télécharger ces modèles résolus avec leur documentation détaillée, comprenant les instructions de construction pas-à-pas, et vous en servir comme point de départ de votre travail de simulation. Utilisez l'outil de recherche rapide pour trouver les modèles et applications correspondant à votre domaine d'intérêt. Notez que de nombreux exemples présentés ici sont également accessibles via la Bibliothèques d'Applications intégrée au logiciel COMSOL Multiphysics® et disponible à partir du menu Fichier.
This tutorial model solves for an inductively coupled plasma reactor in a mixture of SF6/argon. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. En savoir plus
This tutorial model solves for a hydrogen plasma created in a microwave cavity. The model computes the fluid flow and gas heating self-consistently. En savoir plus
This tutorial model solves for an inductively coupled plasma reactor with RF bias (also known as ICP/CCP reactors) in a mixture of argon/chlorine. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. En savoir plus
This tutorial model solves for an inductively coupled plasma reactor in a mixture of argon/oxygen. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. En savoir plus
In this example, a hydrogen plasma reactor at moderate pressure is studied using a global model. The heavy species heat equation is included. In the first part of the study, a Maxwellian electron energy distribution function is used. In the second part, the global model is solved self ... En savoir plus
In this example, the etching of silicon in a CF4/O2 plasma reactor is studied using a global model. Parametric sweeps for ion energy and oxygen mole fraction are computed. En savoir plus
This tutorial studies the deposition of amorphous silicon using an inductively coupled plasma reactor with a silane/argon gas mixture. It examines how the deposition rate varies across the wafer as a function of silane mole fraction and input power. En savoir plus
The pyrolysis of a centimeter-sized wood particle presents a fully coupled multiphysics problem with mass transfer, fluid flow, and heat transfer. This example model consists of two parts. The first part demonstrates how to set up a model describing the pyrolysis of a porous, ... En savoir plus
This tutorial studies the etching of silicon using an inductively coupled plasma reactor with an RF bias in a mixture of CF4/O2. The etching rate is computed along the wafer as a function of the RF bias voltage. En savoir plus
