La Bibliothèque d'Applications présente des modèles construits avec COMSOL Multiphysics pour la simulation d'une grande variété d'applications, dans les domaines de l'électromagnétisme, de la mécanique des solides, de la mécanique des fluides et de la chimie. Vous pouvez télécharger ces modèles résolus avec leur documentation détaillée, comprenant les instructions de construction pas-à-pas, et vous en servir comme point de départ de votre travail de simulation. Utilisez l'outil de recherche rapide pour trouver les modèles et applications correspondant à votre domaine d'intérêt. Notez que de nombreux exemples présentés ici sont également accessibles via la Bibliothèques d'Applications intégrée au logiciel COMSOL Multiphysics® et disponible à partir du menu Fichier.
This tutorial model demonstrates how to compute the impedance of a capacitively coupled plasma. The Time Periodic study computes the time periodic solution of the plasma. Subsequently, the solution is transformed to the time domain, after which the fast Fourier transform (FFT) solver is ... En savoir plus
This model shows how to simulate a capacitively actuated surface micromachined accelerometer, using the Electromechanics Interface. It is based on a case study from the book Microsystem Design by Stephen D. Senturia (Kluwer Academic Publishers, 5th Edition, 2003, pages 513-525). En savoir plus
Steel structures immersed in seawater can be protected from corrosion through cathodic protection. This protection can be achieved by an impressed external current or by using sacrificial anodes. The use of sacrificial anodes is often preferred due to its simplicity. This example models ... En savoir plus
This tutorial model explains how to extract lumped matrices by means of the Stationary Source Sweep study. The capacitance matrix of a five-terminal system is used to infer the position of a metallic object similar to real-world capacitive position sensors. The example illustrates the ... En savoir plus
This tutorial studies the etching of silicon using an inductively coupled plasma reactor with an RF bias in a mixture of CF4/O2. The etching rate is computed along the wafer as a function of the RF bias voltage. En savoir plus
In this example, an SF6/argon plasma reactor at moderate pressure is studied using a global model. The heavy species heat equation is included. Parametric sweeps for input power and argon mole fraction are computed. En savoir plus
This model simulates a holographic page data storage system. The studies include the recording and retrieval processes. The object beam encrypting 8-bit data is focused into a holographic material by a Fourier lens (Fourier transformation). In the recording process, the object beam ... En savoir plus
This model simulates an electrodeless lamp with argon/mercury chemistry. The low excitation threshold for mercury atoms means that even though the mercury is present in small concentrations, its behavior dominates. There is strong UV emission from the plasma at 185 nm and 253 nm. The UV ... En savoir plus
Plasma discharges containing chlorine are commonly used to etch semiconductors and metals in microelectronics fabrication. This tutorial model studies chlorine plasma discharges using a global (volume-averaged) diffusion model. Global diffusion models can run simulations in a fraction ... En savoir plus
A bipolar membrane consists of one anion-selective, and one cation-selective membrane, in contact with each other. The combined cation and anion selectivity makes the bipolar membrane highly impermeable to all ions, with the exception of H+ and OH- which are formed by water splitting ... En savoir plus