La Bibliothèque d'Applications présente des modèles construits avec COMSOL Multiphysics pour la simulation d'une grande variété d'applications, dans les domaines de l'électromagnétisme, de la mécanique des solides, de la mécanique des fluides et de la chimie. Vous pouvez télécharger ces modèles résolus avec leur documentation détaillée, comprenant les instructions de construction pas-à-pas, et vous en servir comme point de départ de votre travail de simulation. Utilisez l'outil de recherche rapide pour trouver les modèles et applications correspondant à votre domaine d'intérêt. Notez que de nombreux exemples présentés ici sont également accessibles via la Bibliothèques d'Applications intégrée au logiciel COMSOL Multiphysics® et disponible à partir du menu Fichier.
Loudspeaker design is a challenging task, where the design objective is to achieve better sound quality without violating manufacturing and operational constraints. The quality of sound depends on many parameters; one of them is the ability to control, damp, and shift the diaphragm ... En savoir plus
This model simulates a plasma at medium pressure (2 torr) where the plasma is still not in local thermodynamic equilibrium. At low pressures the two temperatures are decoupled but as the pressure increases the temperatures tend towards the same limit. En savoir plus
This tutorial studies the deposition of amorphous silicon using an inductively coupled plasma reactor with a silane/argon gas mixture. It examines how the deposition rate varies across the wafer as a function of silane mole fraction and input power. En savoir plus
This is an example of a model of an induction motor in which eddy currents are induced in the rotor by time-harmonic currents in the stator windings and the rotor's rotation. Induced currents in the rotor interact with the magnetic field that is produced by the coils to generate the ... En savoir plus
This tutorial model solves for an inductively coupled plasma reactor with RF bias (also known as ICP/CCP reactors) in a mixture of argon/chlorine. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. En savoir plus
This tutorial studies the etching of silicon using an inductively coupled plasma reactor with an RF bias in a mixture of CF4/O2. The etching rate is computed along the wafer as a function of the RF bias voltage. En savoir plus
This model presents a 2D axisymmetric dipolar microwave plasma source sustained through resonant heating of the electrons. This is known as electron cyclotron resonance (ECR), which occurs when a suitable high magnetic flux density is present along with the microwaves. This is an ... En savoir plus
This tutorial models an ICP reactor by solving plasma fluid type equations fully coupled with the homogeneous and time-independent electron Boltzmann equation in the classical two-term approximation. The approximated Boltzmann equation is solved for each position of space and is coupled ... En savoir plus
This tutorial model solves for an inductively coupled plasma reactor in a mixture of SF6/argon. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. En savoir plus
This tutorial model solves for an inductively coupled plasma reactor in a mixture of argon/oxygen. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. En savoir plus
