La Bibliothèque de Modèles présente des modèles construits avec COMSOL Multiphysics pour la simulation d'une très grande variété d'applications, dans les domaines électrique, mécanique, fluidique et chimique. Vous pouvez télécharger ces modèles résolus avec leur documentation détaillée, notamment les instructions de construction pas à pas, et vous en servir comme point de départ de votre travail de simulation. Utilisez l'outil de recherche rapide pour trouver les modèles correspondant à votre domaine d'intérêt, et connectez vous avec votre compte COMSOL Access, associé à une licence COMSOL, afin de télécharger les fichiers modèles.

Benchmark Model of a Capacitively Coupled Plasma

The underlying physics of a capacitively coupled plasma is rather complicated, even for rather simple geometric configurations and plasma chemistries. This model benchmarks the Capacitively Coupled Plasma physics interface against many different codes.

Dipolar Microwave Plasma Source

This model presents a 2D axisymmetric dipolar microwave plasma source sustained through resonant heating of the electrons. This is known as electron cyclotron resonance (ECR), which occurs when a suitable high magnetic flux density is present along with the microwaves. This is an advanced model that showcases many of the features that make COMSOL unique, including: Infinite elements for the ...

Ion Energy Distribution Function

One of the most useful quantites of interest after solving a self-consistent plasma model is the ion energy distribution function (IEDF). The magnitude and shape of the IEDF depends on many of the discharge parameters; pressure, plasma potential, sheath width etc. At very low pressures the plasma sheath is said to be collisionless, meaning that the ion energy is not retarded by collisions with ...

Capacitively Coupled Plasma

The NIST Gaseous Electronics Conference has provided a platform for studying Capacitively Coupled Plasma (CCP) reactors, which is what this application is based upon. The operating principle of a capacitively coupled plasma is different when compared to the inductive case. In a CCP reactor, the plasma is sustained by applying a sinusoidal electrostatic potential across a small gap filled with a ...

Oxygen Boltzmann Analysis

The Boltzmann equation can be solved to validate sets of electron impact collision cross sections. In fact, sets of collision cross sections are traditionally inferred by solving a two-term approximation to the Boltzmann equation and comparing the results to swarm experiments. This model solves a two-term approximation to the Boltzmann equation and compares the computed drift velocity and ...

Argon Boltzmann Analysis

The electron energy distribution function (EEDF) plays an important role in the overall behavior of discharges. Analytic forms of the EEDF exist such as Maxwellian or Druyvesteyn, but in some cases they fail to fit the discharge physics. This tutorial model investigates the effects of various parameters on the electron energy distribution function and rate coefficients for an argon discharge.

Electrodeless Lamp

This model simulates an electrodeless lamp with argon/mercury chemistry. The low excitation threshold for mercury atoms means that even though the mercury is present in small concentrations, its behavior dominates. There is strong UV emission from the plasma at 185 nm and 253 nm. The UV emission can stimulate phosphors coated on the surface of the bulb. From an electrical point of view, the lamp ...

GEC CCP Reactor, Argon Chemistry, 1D

The NIST GEC CCP reactor provides a platform for studying capacitively coupled plasmas. Even the simplest plasma models are quite involved so a 1D example helps in understanding the physics without excessive CPU time. The problem has no steady-state solution, although a periodic steady-state solution is reached after a suitable number of RF cycles (usually >1000).

Harmonic Content of the Power Deposition into a Dual Frequency Capacitively Coupled Plasma

Energy transfer from the time varying electrostatic field to electrons in a capacitively coupled plasmas (CCP) does not exclusively occur at twice the RF frequency. Due to the highly nonlinear mechanism of power transfer from the fields to the electrons, power deposition occurs at frequencies higher than twice the driving frequency. For dual frequency CCP reactors the harmonic content of the ...

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