A Model of a Horizontal Atmospheric Pressure Chemical Vapor Deposition Reactor

T. Adams

Naval Surface Warfare Center Crane Division, CRANE, IN, USA
Published in 2008

A model of a horizontal atmospheric pressure chemical vapor deposition reactor was implemented to aid in the design of a laboratory based one.

The model coupled momentum transport, energy transport, and mass transport phenomena to account for reacting fluid flow of a compressible gas in a heated chamber. The system modeled was silicon deposition from trichlorosilane in hydrogen carrier gas.

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